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The system consists of a sputtering chamber connected to an electron beam evaporator...
Maskless high-resolution lithography system for fabrication of custom shapes on...
The DWL 66 laser lithography system is an economical, high resolution pattern...
DC/RF Magnetron Sputtering of thin films.
Nano Imprint Tool MA 6 (Süss Microtec)
MBJ4 (Süss Microtec), MA 6 (Süss Microtec)
SAMCO's RIE-140iP is a single wafer ICP etching system especially designed for high...
Reactive ion etching of dielectric layers, semiconductor and polymers.
The RAITH150 Two Electron Beam lithography(EBL) systemexposes structures smaller than...
Wet benches and fume hoods. A chemical laboratory is also available for HF acid and...
Dr. Abbes Tahraoui
Scientific Head of Technology
phone: +49 30 20377 414
Paul-Drude-Institut für Festkörperelektronik Leibniz-Institut im Forschungsverbund Berlin e.V.
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