Nanofabrication

Group-III-nitrides

These alloys are materials very well suited for a variety of optoelectronic applications as they possess a direct band gap. The band gaps of III-nitride alloys cover an extended wavelength range from the near infrared into the visible and up to the ultra-violet. Additionally, outstanding properties of this material system are "polarization doping" and piezoelectricity. It is possible to obtain two-dimensional carrier densities of about 1013 cm-2 without doping, only due to a discontinuity of the internal polarization at the heterojunction. Thus, electron velocities larger than 2∙107 cm/s have been reached. Nitride transistors have indeed already shown excellent performance in planar structures. Adding up these entire qualities one can conclude that nitrides represent one of the most versatile semiconductor material systems. 

 

However, a persisting problem in the field of group-III nitride epitaxy is the unavailability of native substrates. Although some progress has been achieved for GaN substrates, the vast majority of epitaxial films is still grown on foreign substrates with substantial lattice and thermal mismatch, resulting in a high density of structural defects intersecting the epitaxial layers. Given the high commercial relevance of group-III nitride devices that is predicted to increase further, the investigation of epitaxial growth on novel types of substrates is very important. 

 

At present, our focus is on In-rich (In,Ga)N and InN layers. On that subject we obtained funding by the European Community in an Innovative Training Network supported by the Marie Skłodowska-Curie Actions on a project entitled: Short Period Superlattices for Rational (In,Ga)N




5 Author C. Chèze , R. Calarco
Title

Self-limited In incorporation in (In,Ga)N/GaN short-period superlattices

Source Nanosci. Nanotechnol. Lett. , 9 , 1118 ( 2017 )
DOI : 10.1166/nnl.2017.2442 | 2911 Cite : Bibtex RIS
C. Chèze, and R. Calarco

4 Author C. Chèze , F. Feix , M. Anikeeva , T. Schulz , M. Albrecht , H. Riechert , O. Brandt , R. Calarco
Title

In/GaN(0001)- (√3 × √3) R30° adsorbate structure as a template for embedded (In,Ga)N/GaN monolayers and short-period superlattices

Source Appl. Phys. Lett. , 110 , 072104 ( 2017 )
DOI : 10.1063/1.4976198 | Download: PDF | 2878 Cite : Bibtex RIS
C. Chèze, F. Feix, M. Anikeeva, T. Schulz, M. Albrecht, H. Riechert, O. Brandt, and R. Calarco

3 Author F. Feix , T. Flissikowski , C. Chèze , R. Calarco , H. T. Grahn , O. Brandt
Title

Individual electron and hole localization in submonolayer InN quantum sheets embedded in GaN

Source Appl. Phys. Lett. , 109 , 042104 ( 2016 )
DOI : 10.1063/1.4960006 | Download: PDF | 2821 Cite : Bibtex RIS
F. Feix, T. Flissikowski, C. Chèze, R. Calarco, H. T. Grahn, and O. Brandt

2 Author Y. Cho , S. Sadofev , S. Fernández-Garrido , R. Calarco , H. Riechert , Z. Galazka , R. Uecker , O. Brandt
Title

Impact of substrate nitridation on the growth of InN on In2O3(111) by plasma-assisted molecular beam epitaxy

Source Appl. Surf. Sci. , 369 , 159 ( 2016 )
DOI : 10.1016/j.apsusc.2016.01.268 | 2735 Cite : Bibtex RIS
Y. Cho, S. Sadofev, S. Fernández-Garrido, R. Calarco, H. Riechert, Z. Galazka, R. Uecker, and O. Brandt

1 Author F. Isa , C. Chèze , M. Siekacz , C. Hauswald , J. Lähnemann , S. Fernández-Garrido , T. Kreilinger , M. Ramsteiner , Y. A. Rojas Dasilva , O. Brandt , G. Isella , R. Erni , R. Calarco , H. Riechert , L. Miglio
Title

Integration of GaN crystals on micro-patterned Si(0 0 1) substrates by plasma-assisted molecular beam epitaxy

Source Cryst. Growth Des. , 15 , 4886 ( 2015 )
DOI : 10.1021/acs.cgd.5b00727 | 2720 Cite : Bibtex RIS
F. Isa, C. Chèze, M. Siekacz, C. Hauswald, J. Lähnemann, S. Fernández-Garrido, T. Kreilinger, M. Ramsteiner, Y. A. Rojas Dasilva, O. Brandt, G. Isella, R. Erni, R. Calarco, H. Riechert, and L. Miglio

Contact

Dr. Lutz Geelhaar

Head of Department

+49 30 20377-359

geelhaar@pdi-berlin.de