MBE chamber for oxides
Rare earth oxides on Si
The third MBE machine has a pumping configuration optimized for high gas loads and more frequent opening of the growth chamber. It is fitted with three big turbo pumps backed by smaller turbos to achieve a low base pressure and short pumpdown times. The cell ports are equipped with additional water cooling jackets to deal with the high power loads of high-temperature effusion sources and e-beam evaporators required for oxide deposition.
The middle chamber of its transfer module has storage and growth capacity with the possibility of deposition from several effusion cells. This chamber is used to fabricate layer structures of dissimilar materials such as tungsten gates for CMOS gate stacks. Like all our systems, the transfer module has a port for small UHV shuttles that allow us to transfer samples without breaking the vacuum, either between the different MBE systems at BESSY or to MBE machines at PDI downtown.
