In-situ real-time x-ray diffraction studies at BESSY
The in-situ x-ray diffraction at the Berlin synchrotron BESSY has been established to investigate surfaces and interfaces of epitaxial layers during molecular beam epitaxy (MBE) growth. The successful operation of such a setup critically depends on the continuous stationary operation of the MBE at the synchrotron, since a high quality of the epitaxial layers and interface is imperative for a reliable quantitative analysis. The research emphasizes the understanding of the growth kinetics and the formation and evolution of buried interfaces and epilayers under real conditions and in real time.
Current research topics comprise the structure and interfaces of following systems
- Fe3Si/GaAs ferromagnet-semiconductor hybrid structure
- Rare-earth oxides on Si(001) as high-k materials
- Epitaxial pseudobinary GeTe-Sb2Te3
- phase change materials

