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Deutscher MBE Workshop 2011

Wir danken allen Teilnehmern und Teilnehmerinnen für einen interessanten und stimulierenden Workshop:

05. - 06.10.2011, Jerusalemkirche, Berlin

Deutscher MBE Workshop

Wir setzen das erfolgreiche Format dieser Reihe von Veranstaltungen fort, die zuletzt in Bochum (2009), Zürich (2008) und Jülich (2007) abgehalten wurden.

more information
International workshop on atomic-scale manipulation and spectroscopy (AMS 2011)

The workshop was held on October 13 and 14, 2011, at NTT Atsugi R&D center.

The workshop is organized by NTT, Japan and PDI, Germany.

We thank all participants who made this workshop a real success!

Workshop webpage
Impressum

gesetzlich vorgesehene Pflichtangaben zur Kennzeichnung und rechtliche Hinweise zur Internetpräsenz (2010)

Clean-Room Facilities

CleanroomThe cleanroom for the semiconductor technology processes

is supervised by Dr. Abbes Tahraoui.

 

 

 

 

 

 

 

The main device-fabrication systems are:

 

 

laser writerA laser-wirter for mask-fabrication

Device DWL66,

Resolution 0.7 micrometer

Responsible: Werner Seidel

 

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fotolithographyPhotolithography:

Device: MBJ4,   UV 400,   Resolution: 0.7µm

            MA6,   DUV 248,  Resolution: 0.5µm

Responsible: W. Seidel, W. Anders

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NanoimprintNanoimprintlithography:

Device: MA6

in preparation

Responsible: W. Seidel

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Dry_etchingDry etching:

Device: SI 591, RIE and DC

Gases: Ar, N2, O2, Cl2, SF6, CF4, BCl3

Responsible: W. Anders

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MetallisationMetallization:

Devices: B 30 and L560 thermical and e-beam evaporation

Metal: Al, Au, Ti, Pt, Cr:Ni, Au:Be, Au:Ge

Responsible: B. Drescher

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Sputtering:

Device:L 440,  DC and RF,  HV, ZnO and SiO2

DC and RF, UHV, AlN and SiO2

Responsible: B. Drescher

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Wet etching:

Chemical Lab

Responsible: A. Riedel


        

 

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