Reactive Ion Etching
Reactive ion etching of dielectric layers, semiconductor and polymers.
The system is connected to CHF3, SF6, CF4, O2, Ar and N2 gases for different etching processes.
Reactive ion etching of dielectric layers, semiconductor and polymers.
The system is connected to CHF3, SF6, CF4, O2, Ar and N2 gases for different etching processes.