Dual Ion Beam Sputtering
The system consists of a sputtering chamber connected to an electron beam evaporator system. Samples can be transferred under high vacuum from one system to another, for oxides or metals deposition.
- Sputtering of thin film insulators: AlN, ZnO2, SiO2.
- Metals deposition: Au, Al, Pt, Ni, Pd, Ti
- Various substrate materials
- Maximum wafer size: 4 inch