1. Home
  2. PDI
  3. Facilities
  4. Dual Ion Beam Sputtering

Dual Ion Beam Sputtering

The system consists of a sputtering chamber connected to an electron beam evaporator system. Samples can be transferred under high vacuum from one system to another, for oxides or metals deposition.

  • Sputtering of thin film insulators: AlN, ZnO2, SiO2.
  • Metals deposition: Au, Al, Pt, Ni, Pd, Ti
  • Various substrate materials
  • Maximum wafer size: 4 inch