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Laser Lithography

The DWL 66 laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing.

  • Applicable for mask making or direct exposure on basically any flat material coated with photo resist.
  • Numerous optional features increase the flexibility and make the system suitable for more applications.
  • Substrates up to: 6 Inch
  • Laser writing wavelength: 405nm
  • Resolution: 0.7μm