Ultra-high Resolution Electron Beam Lithography system RAITH150 Two
The RAITH150 Two Electron Beam lithography(EBL) systemexposes structures smaller than 8 nm and works with sample sizes from a few mm to 8-inch wafers.
The RAITH150 Two Electron Beam lithography(EBL) systemexposes structures smaller than 8 nm and works with sample sizes from a few mm to 8-inch wafers.